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KM-205100% PFAS-free

100% Solids LRI NIL Resin

Solvent-free 100% solids low-refractive-index UV resin formulated for nanoimprint lithography (NIL) of waveguide cladding and metalens spacer layers. Reproduces sub-100 nm features at R2R scale with low cure shrinkage. PFAS-free; compatible with glass, polymer film, and Si wafer substrates.

Refractive index rangen = 1.35–1.45
1.162.00
Chemistry family100% solids UV-curable
Cure typeUV
Product blockKM-205
Request a sampleExplore RI range

Specifications

Functions

Low RIAnti-reflective

Compatible substrates

GlassPETSi wafer

Processing methods

NILR2RSLOT DIESPIN

Refractive index range

1.35–1.45
1.162.00
PropertyValue
Product codeKM-205
Chemistry family100% solids UV-curable
Refractive index range1.35–1.45
Cure typeUV
PFAS status100% PFAS-free
FunctionsLow RI, Anti-reflective
Compatible substratesGlass, PET, Si wafer
ProcessingNIL, R2R, SLOT DIE, SPIN
Product blockKM-205
Batch sizesFrom 40 kg sample to production scale
Shelf life6 months (unopened)
QualityISO 9001:2015 certified. Filtered to 0.8 µm. Up to 10 CTQ parameters per batch.

Related applications

AR/VR & WaveguidesView application →Photonics & MetalensesView application →

Request a sample

Available from 40 kg sample batches. Every batch filtered to 0.8 µm and tested on up to 10 critical-to-quality parameters.

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