ARAF 나노입자 조성, 기준 반사율의 0.3배 달성
일본 주요 AR 필름 제조업체
핵심 지표
01
과제
The AR film manufacturer needed a nanoparticle ARAF composition that could achieve ultra-low reflection significantly below their internal reference level, while maintaining acceptable haze and anti-smudge properties for premium display applications.
02
접근 방법
Kriya developed ARAF nanoparticle compositions in two particle sizes (50 nm for low reflection, 75 nm for super-low reflection). Multiple formulation versions were tested at the manufacturer’s facility against their internal reference samples, measuring reflection, haze, transmission, steel wool abrasion, and anti-smudge performance.
03
성과
The 75 nm super-low-reflection variant achieved reflection at 0.3× the reference level with 95.6% total transmission and 0.5% haze. The 50 nm low-reflection variant achieved 0.7× reference reflection with improved abrasion resistance. Both variants passed anti-smudge (fingerprint and marker wipe-off) testing.
Kriya를 선택하는 이유
Kriya’s tuneable nanoparticle platform enables precise control over the reflection–abrasion trade-off, allowing customers to select the optimal balance for their application.
핵심 지표
사용 제품
관련 응용 분야
Displays — ULR →유사한 응용 상담
기술팀이 귀하의 요구사항에 이 접근 방법이 적용 가능한지 평가해 드리겠습니다.