所有产品
KM-040100%无PFAS
Multilayer Antireflection
Multi-layer anti-reflection stack utilising Kriya’s full RI platform (1.35–1.95) to achieve broadband residual reflectance below 0.15%. Validated on PET, PC, PMMA, and TAC substrates with transmission gains of 2–3.3%.
规格
功能
Anti-reflectiveMultilayer AR
兼容基材
PETPCPMMATACGlass
加工方法
SPINDIPROLLGRAVURESLOT DIE
折射率范围
1.35–1.95
1.162.00
| 属性 | 值 |
|---|---|
| 产品代码 | KM-040 |
| 化学体系 | Solvent UV-curable hybrid |
| 折射率范围 | 1.35–1.95 |
| 固化类型 | Dual-cure |
| PFAS状态 | 100%无PFAS |
| 功能 | Anti-reflective, Multilayer AR |
| 兼容基材 | PET, PC, PMMA, TAC, Glass |
| 加工 | SPIN, DIP, ROLL, GRAVURE, SLOT DIE |
| 产品系列 | KM-001–040 |
| 批次规模 | 从40 kg样品到量产规模 |
| 保质期 | 6个月（未开封） |
| 质量 | ISO 9001:2015认证。过滤至0.8 µm。每批次最多10个CTQ参数。 |
相关案例
Displays0.41%Haze (vs 0.68% incumbent)ULR coating achieves 0.41% haze vs 0.68% incumbent on polariser filmDisplays<0.15%Residual reflectanceBroadband reflectance below 0.15% achieved on multi-layer AR stackDisplays — ULR0.3×Reflection vs referenceARAF nanoparticle composition achieves 0.3× reference reflection level
申请样品
从40 kg样品批次开始提供。每批次0.8 μm过滤，最多10个CTQ参数测试。