ARAF nanoparticle composition achieves 0.3× reference reflection level
A leading Japanese AR film manufacturer
核心指标
01
挑战
The AR film manufacturer needed a nanoparticle ARAF composition that could achieve ultra-low reflection significantly below their internal reference level, while maintaining acceptable haze and anti-smudge properties for premium display applications.
02
我们的方法
Kriya developed ARAF nanoparticle compositions in two particle sizes (50 nm for low reflection, 75 nm for super-low reflection). Multiple formulation versions were tested at the manufacturer’s facility against their internal reference samples, measuring reflection, haze, transmission, steel wool abrasion, and anti-smudge performance.
03
成果
The 75 nm super-low-reflection variant achieved reflection at 0.3× the reference level with 95.6% total transmission and 0.5% haze. The 50 nm low-reflection variant achieved 0.7× reference reflection with improved abrasion resistance. Both variants passed anti-smudge (fingerprint and marker wipe-off) testing.
为什么选择Kriya
Kriya’s tuneable nanoparticle platform enables precise control over the reflection–abrasion trade-off, allowing customers to select the optimal balance for their application.
核心指标
使用产品
相关应用
Displays — ULR →讨论类似应用
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