ARAF nanoparticle composition achieves 0.3× reference reflection level
A leading Japanese AR film manufacturer
מדדים מרכזיים
01
האתגר
The AR film manufacturer needed a nanoparticle ARAF composition that could achieve ultra-low reflection significantly below their internal reference level, while maintaining acceptable haze and anti-smudge properties for premium display applications.
02
הגישה שלנו
Kriya developed ARAF nanoparticle compositions in two particle sizes (50 nm for low reflection, 75 nm for super-low reflection). Multiple formulation versions were tested at the manufacturer’s facility against their internal reference samples, measuring reflection, haze, transmission, steel wool abrasion, and anti-smudge performance.
03
התוצאה
The 75 nm super-low-reflection variant achieved reflection at 0.3× the reference level with 95.6% total transmission and 0.5% haze. The 50 nm low-reflection variant achieved 0.7× reference reflection with improved abrasion resistance. Both variants passed anti-smudge (fingerprint and marker wipe-off) testing.
למה Kriya
Kriya’s tuneable nanoparticle platform enables precise control over the reflection–abrasion trade-off, allowing customers to select the optimal balance for their application.
מדדים מרכזיים
מוצרים בשימוש
יישום קשור
Displays — ULR →דונו ביישום דומה
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